HORIBA LE Large Flow Liquid Source Vaporization Control System

HORIBALELarge Flow Liquid Source Vaporization Control SystemSpecifications:Application liquidH2O/IPA/TEOS/SiCl4Please contact HORIBA if you require vaporizing any liquid materials that are not listed

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HORIBA

Large Flow Liquid Source Vaporization Control System

Specifications:

Application liquid	H2O/IPA/TEOS/SiCl4 Please contact HORIBA if you require vaporizing any liquid materials that are not listed here.
Maximum vaporization volume (gas flow rate)	H2O : 10g/min (12.4 SLM) IPA ： 30g/min (11.1 SLM） TEOS : 50g/min（5.3 SLM） SiCl4 ： 130g/min（17.1 SLM）