USHIO UX1 Manual exposure equipment UX1
USHIOUX1Manual exposure equipment UX1Specifications:U high resolutionThe highest resolution is Line & Space = 1um (vacuum hard contact). The following is (L/S)Proximity exposure, Print Gap 20um, a
- model：
USHIO
UX1
Manual exposure equipment UX1
Specifications:
U high resolution
The highest resolution is Line & Space = 1um (vacuum hard contact). The following is (L/S)
Proximity exposure, Print Gap 20um, achieves high resolution of L/S 3um.
In addition, the work surface has high flatness, good Gap stability, and good exposure line width stability performance.
U achieves high-precision positioning
Reconsing accuracy: frontal position ±1um, back position ±1.5um. It can correspond to various substrate materials (Silicon, GaAs, Sapphire, Crystal, etc.) and various positioning targets, providing the most appropriate lighting and image processing software technology to achieve high-precision positioning.
U LCD photosensitive material evaluation equipment
In the application of LCD Color Filter exposure light source, USHIO's light source technology has a relatively high market share. Using this technology, it can be proposed that a simple exposure device is used for the LCD to perform shipment inspection with photosensitive materials.